Physical vapor deposition

English refers to the "phisical vapor deposition" abbreviation PVD. Is commonly used in the coating industry term. PVD (physical vapor deposition) coating technology is divided into three categories, vacuum evaporation coating, vacuum sputtering and vacuum ion plating. Corresponding to the three classifications of PVD technology, the corresponding vacuum coating equipment also includes vacuum evaporation coating machine, vacuum sputtering coating machine and vacuum ion coating machine. Over the past decade, the development of vacuum ion plating technology has been rapid, and it has become one of the more advanced surface treatment methods today. What we usually call PVD coating refers to vacuum ion plating; commonly referred to as PVD coating machine refers to vacuum ion coating machine. Physical Vapor Deposition (PVD) Physical vapor deposition (PVD) is the process of evaporation, ionization, or sputtering that generates metal particles and reacts with reactive gases to form compounds that deposit on the surface of the workpiece. The physical meteorological deposition methods include vacuum plating, vacuum sputtering and ion plating. Currently, ion plating is widely used. Ion plating uses inert gas glow discharge to vaporize and ionize the plating material (such as titanium metal). The ions are accelerated by the electric field and bombard the workpiece surface with higher energy. At this time, reactive gases such as CO2 and N2 are introduced. TiC, TiN coating layer can be obtained on the surface of the workpiece, the hardness up to 2000HV. The important characteristic of ion plating is that the deposition temperature is only about 500 °C, and the covering layer has strong adhesion. It is suitable for high-speed steel tools, hot forging dies, etc.