Minerals_Ministry of Science and Technology Releases New Material Technology Ultra High Purity Aluminum Target Project Application

According to the Ministry of Science and Technology, physical vapor deposition (PVD) is one of the most critical processes in the production of semiconductor chips and TFT-LCDs. Sputtering of metal targets for PVD is the most important step in semiconductor chip production and TFT-LCD manufacturing and processing. One of the raw materials, the largest amount of sputtered metal target is ultra-high purity aluminum and ultra-high purity aluminum alloy target.
It can be seen that the key technologies for the development of large-size ultra-high-purity aluminum targets with independent intellectual property rights are developed, and ultra-high-purity aluminum target products that meet the needs of the semiconductor industry and the TFT-LCD industry are developed and have the potential for the development of related industries in China. Significance.
To provide fair, equitable, and open choice of project undertakers to fully mobilize the enthusiasm of relevant companies, scientific research institutes and institutions of higher education, and integrate the country in the fields of refining and refining of aluminum, large-size aluminum plate deformation, and professional preparation of sputtered metal targets. The strengths of R&D to carry out the work of this project, the Ministry of Science and Technology issued the "National High-tech Research and Development Program (863 Plan) new materials technology field "large-size ultra-high purity aluminum target manufacturing technology" key project application guidelines.